The Wisconsin Center for Applied Microelectronics is a shared core facility, which provides instrumentation for micro and nano scale fabrication, again on a fee based cost recovery system. The Center is located within 6,700 square feet of cleanroom space including 1,280 square feet of Class 10 space. The Center’s lithography capabilities include an Obducat NIL-25 Nano-imprinter and several contact aligners. A Nikon NSR-2005i8A I-line stepper is a new addition to the lab. Numerous plasma etch systems are available including five ICP systems, one ECR system, and two RIE systems. LPCVD furnace tubes and oxidation tubes are available along with a rapid thermal anneal system. Deposition resources include three e-beam evaporators and one sputtering system. Numerous wet chemical hoods are located throughout the cleanroom. A critical point dryer and a wafer bonder provide unique solutions for MEMs processing. Two wafer saws, a diamond scribe, a die attacher, and two wire bonders provide a means to package devices.