The Center for NanoTechnology develops novel technologies with a wide range of applications - from making integrated circuits to genes. The work includes creating patterns at the nanoscale using extreme ultraviolet, electron beam and x-ray lithography that will eventually lead to new processes in the computer chip and biotech industries. Facilities that form the basis for this work include several dedicated beamlines and end-stations in clean rooms at the UW Synchrotron Radiation Center. In addition to synchrotron light, lithography mask making and characterization tools are available. Instrumentation includes; UV, EUV and e-beam (JEOL JBX-5D2-U) exposure tools, and various characterization tools including, an FESEM with EDS, Alpha Step Profilometer, Davidson interferometer, Rudolph elipsometer, Veeco AFM, On-line Technologies FT-IR, PE FT-IR, and various Nikon optical metrology tools.

Director: Prof. Franco Cerrina
Lab Manager: various

The Center for NanoTechnology (CNTech)